tl;dr: Intel has begun high-volume manufacturing using ASML's $380M High-NA EUV scanners, patterning select layers on its 18A-based Panther Lake laptop chips with yields matching existing Low-NA tools. The layers are dual-qualified on both tools, letting Intel build process expertise ahead of 14A/10A where High-NA becomes more essential, while TSMC has opted to skip the technology through at least its A16 node. Analysts remain split on economics—a High-NA exposure costs ~2.5x a Low-NA one and only pays off when replacing three or more multi-patterning steps.